MASKLESS LITHOGRAPHY SYSTEM POLOS ¥ìPrinter   Spincoater Main

MASKLESS LITHOGRAPHY SYSTEM POLOS ¥ìPrinter(polos micro printer, ¸¶ÀÌÅ©·Î ÇÁ¸°ÅÍ)

The POLOS ¥ìPrinter is a maskless lithography equipment for rapid-prororyping,
(Polos ¸¶½ºÅ©¸®½º ¸®¼Ò±×·¡ÇÇ ½Ã½ºÅÛ, ºü¸¥ ÇÁ·ÎÅä ŸÀÔ Á¦ÀÛ °¡´É)

based on a ¥ìLCD projection technology,
compatible with a wide range of resists and substrates.

-Çϵ帶½ºÅ©¸¦ Á¦ÀÛÇÒ ÇÊ¿ä¾øÀÌ Ä³µåµµ¸éÀ» ¿þÀÌÆÛ³ª ±Û·¡½º¿¡ ¹Ù·Î ³ë±¤ÇÏ´Â ¹æ½Ä

Our system can produce any 2D shapes at micron resolution without the need for a hard-mask.
- ÇÏµå ¸¶½ºÅ© Á¦ÀÛ ¾øÀÌ ¸¶ÀÌÅ©·Ð ´ÜÀ§ÀÇ ³ë±¤ °¡´É

   

 

Key features

-¶óÀÌÆà ÇØ»óµµ >2 ¥ìm

-Adjustable writing field and resolution with exchangeable objectives

Compatible with CAD files or bitmap images

Compatible with g-line photoresists

Compatible with a wide range of substrates (silicon, glass, metal, plastic, ... )


Compatible with any sample size up to 4¡± wafer Camera feedback for alignment steps

 

Key benefits

Time and money saving due to the absence of a hard-mask

lntuitive alignment method with direct overlay of the design on the sample

Table-top with very small foot print

Technology well suited for microelectronics, 2D-materials, microfluidics, optoelectronics, opties or any other 2D microfabrication application

MASKLESS LITHOGRAPHY SYSTEM POLOS ¥ìPrinter(polos micro printer, ¸¶ÀÌÅ©·Î ÇÁ¸°ÅÍ)

SPECIFICATIONS (polos micro printer, ¸¶ÀÌÅ©·Î ÇÁ¸°ÅÍ)

Microfabrication system

Light source

Exposure: 435 nm; alignment: 525 nm

Minimum feature size

Adjustable from 2 to 23 ¥ìm

Alignment resolution

Down to 1 ¥ìm/cm2

Maximum exposure area

75 x75 mm2

Substrate size

Up to 4¡± wafers

System dimensions

W: (36 cm); D: (36 cm); H: (60 cm)

Software package

All-in-one PC

With Win 10, 24" full HD

SFTprint software

Machine control, step-and-repeat, automatic dose test, stitching, alignment

SFTconverter

Convertion of standard formats (gdsii, dxf, cif, oas) to bitmap images. CAD software included

Options and accessories Multiple-sample holder (glass-slide, 4¡± water, ... ) Objectives (see below) Manual or motorized Z stage with tilt correction Manual rotation stage (360¡Æ)

Objective

1X

2.5X

5X

10X

Writing field (mm)

13.6 x 7.7

5.4 x 3.0

2.7x 1.5

1.35 x 0.75

Smallest feature (¥ìm)

23

8

4

2

 

재성ITS co. Tel:031-479-4211/2
jsi@jsits.com
안양시 동안구 호계동 555-9 국제유통상가,17동 127호